Our HSQ negative resist at DisChem Inc. is widely used for high-resolution electron beam lithography applications requiring nanoscale precision. We focus on providing materials that deliver excellent pattern definition, strong etch resistance, and reliable processing performance. With our HSQ resist technology, researchers and engineers can create extremely fine features that support cutting-edge development in nanotechnology, photonics, and semiconductor research.
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Phone Number : +1(814)-7726-603
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[email protected]Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, Pennsylvania 15853 USA
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https://discheminc.com/resi ...