Our HSQ negative resist, also known as H-SiQ, is the premier choice for high-resolution electron beam lithography. At DisChem, Inc., we manufacture this inorganic resist to provide a durable silica-like structure after exposure. This makes it incredibly resistant to plasma etching, which is essential for transferring patterns into hard substrates. We focus on consistent molecular weight and purity to ensure that every bottle of our negative resist performs exactly as expected, supporting the most advanced research in the world.
Contact Us
Phone Number : +1(814)-7726-603
Email ID : [email protected]
Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, Pennsylvania 15853 USA

Website : https://discheminc.com/resi ...
New York, Business, HSQ Negative Resist
Back Next