Electron Beam Charge Dissipation

Effective electron beam charge dissipation helps reduce the effects of surface charging that can disrupt pattern accuracy on insulating substrates. At DisChem Inc., we offer DisCharge H2O to help researchers and manufacturers manage this issue during electron-beam lithography. Our water-based anti-charging agent is designed for convenient application and removal after exposure. If charging affects your current workflow, we invite you to explore our product information and contact us to discuss suitable process considerations.
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Phone Number : +1(814)-7726-603
Email ID : [email protected]
Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, Pennsylvania 15853 USA

Website : https://discheminc.com/e-be ...